METASTABLE THIN FILM EPITAXIAL STRUCTURES

被引:50
作者
CHOPRA, KL
机构
[1] Ledgemont Laboratory, Kennecott Copper Corporation, Lexington, Massachusetts
来源
PHYSICA STATUS SOLIDI | 1969年 / 32卷 / 02期
关键词
D O I
10.1002/pssb.19690320202
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
[No abstract available]
引用
收藏
页码:489 / &
相关论文
共 85 条
[1]  
ANDERSON JC, 1966, USE THIN FILMS PHYSI, P433
[2]   TRIPYRAMIDS AND ASSOCIATED DEFECTS IN EPITAXIAL SILICON LAYERS [J].
BOOKER, GR .
PHILOSOPHICAL MAGAZINE, 1965, 11 (113) :1007-&
[3]  
BOOKER GR, 1964, DISCUSS FARADAY SOC, V38, P298
[4]   THE EQUILIBRIUM OF CRYSTAL SURFACES [J].
CABRERA, N .
SURFACE SCIENCE, 1964, 2 :320-345
[5]   LOW-ENERGY ELECTRON DIFFRACTION OBSERVATIONS OF ALPHA-ALUMINA [J].
CHARIG, JM .
APPLIED PHYSICS LETTERS, 1967, 10 (05) :139-&
[6]  
Chopra K. L., 1969, THIN FILM PHENOMENA
[7]   FACE-CENTRED CUBIC MODIFICATION IN SPUTTERED FILMS OF TANTALUM MOLYBDENUM TUNGSTEN RHENIUM HAFNIUM AND ZIRCONIUM [J].
CHOPRA, KL ;
RANDLETT, MR ;
DUFF, RH .
PHILOSOPHICAL MAGAZINE, 1967, 16 (140) :261-&
[8]   INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].
CHOPRA, KL .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2249-&
[9]   POLYMORPHIC TRANSFORMATION IN EPITAXIAL CDS FILMS [J].
CHOPRA, KL ;
KHAN, IH .
SURFACE SCIENCE, 1967, 6 (01) :33-&
[10]  
CHOPRA KL, 1968, 179 LEDG LAB TECH RE