INTERNAL PHOTOEMISSION MECHANISMS AT INTERFACES BETWEEN GERMANIUM AND THIN METAL-FILMS

被引：32
作者：
CHAN, EY
CARD, HC
TEICH, MC
机构：
[1] COLUMBIA UNIV,RADIAT LAB,NEW YORK,NY 10027
[2] COLUMBIA UNIV,DEPT ELECT ENGN,NEW YORK,NY 10027
[3] WESTERN ELECT CO INC,ENGN RES CTR,PRINCETON,NJ 08540
来源：
IEEE JOURNAL OF QUANTUM ELECTRONICS | 1980年 / 16卷 / 03期
关键词：
D O I：
10.1109/JQE.1980.1070476
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：373 / 381
页数：9
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