LEAKAGE STUDIES IN HIGH-DENSITY DYNAMIC MOS MEMORY DEVICES

被引：18
|
作者：
CHATTERJEE, PK
TAYLOR, GW
TASCH, AF
FU, HS
机构：
来源：
IEEE JOURNAL OF SOLID-STATE CIRCUITS | 1979年 / 14卷 / 02期
关键词：
D O I：
10.1109/JSSC.1979.1051201
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：486 / 498
页数：13
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