INTERFACE ENERGY AS AN ORIGIN OF INTRINSIC STRESS IN THIN-FILMS

被引：3

作者：

ANDRA, W ^{[1
]}

DANAN, H ^{[1
]}

机构：

[1] UNIV STRASBOURG 1,LAB PIERRE WEISS,F-67070 STRASBOURG,FRANCE

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1982年 / 70卷 / 02期

关键词：

D O I：

10.1002/pssa.2210700260

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K145 / K149

页数：5

共 14 条

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KOCH, R ;

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THIN SOLID FILMS, 1979, 58 (02) :365-370

[3] COLUMNAR MICROSTRUCTURE AND MAGNETIC-ANISOTROPY IN THIN-FILMS [J].

ANDRA, W ;

DANAN, H .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 56 (02) :K145-K148

[4] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].

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SENDEROFF, S .

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[5]

Campbell DS, 1970, HDB THIN FILM TECHNO

[6] GRAIN-GROWTH AND STRESS RELIEF IN THIN-FILMS [J].

CHAUDHAR.P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :520-&

[7]

Chopra K.L, 1969, THIN FILM PHENOMENA

[8] AN ELECTRON-DIFFRACTION EXAMINATION OF THIN FILMS OF LITHIUM FLUORIDE AND COPPER PREPARED BY VACUUM EVAPORATION [J].

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RYMER, TB ;

WRIGHT, KHR .

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[9] MECHANICAL-PROPERTIES OF VACUUM-DEPOSITED FILMS - COMMENTARY [J].

KINOSITA, K .

THIN SOLID FILMS, 1978, 50 (MAY) :205-210

[10] RECENT DEVELOPMENTS IN STUDY OF MECHANICAL PROPERTIES OF THIN-FILMS [J].

KINOSITA, K .

THIN SOLID FILMS, 1972, 12 (01) :17-&

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