EFFECT OF NITROGEN ON ELECTRICAL AND STRUCTURAL-PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS

被引：32
作者：
WILLMOTT, DJ [1 ]
机构：
[1] BELL NO RES,OTTAWA,ONTARIO,CANADA
来源：
JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 12期
关键词：
D O I：
10.1063/1.1661039
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：4865 / 4871
页数：7
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