EPITAXY OF THIN CR LAYERS ON CU(001)

被引:20
|
作者
ROUYER, D [1 ]
KREMBEL, C [1 ]
HANF, MC [1 ]
BOLMONT, D [1 ]
GEWINNER, G [1 ]
机构
[1] FAC SCI & TECH MULHOOSE, PHYS & SPECTR ELECTR LAB,CNRS,URA 1435, 4 RUE FRERES LUMIERE, F-68093 MULHOUSE, FRANCE
关键词
D O I
10.1016/0039-6028(94)90440-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin Cr films (6-30 monolayers) have been evaporated in ultra-high vacuum onto a Cu(001) single crystal kept at room temperature and have been studied by low energy electron diffraction (LEED), X-ray photoelectron diffraction (XPD), and angle resolved ultra-violet photoemission (ARUPS). The LEED diagrams obtained for these layers reveal the formation of epitaxial body-centered cubic (bcc) Cr domains with Cr(110) parallel-to Cu(001) and Cr[111BAR] parallel-to Cu[110]. The Cu(001) substrate symmetry results in four different orientations of these domains. This conclusion is confirmed by the XPD data. Indeed the modulations of the Cr2P3/2 core level intensity as a function of emission angle are in agreement with single scattering simulations performed for a superposition of equivalent bcc Cr(110) domains on a Cu(001) substrate. Moreover, ARUPS results at normal emission also indicate that the Cr film exposes a (110) surface.
引用
收藏
页码:477 / 482
页数:6
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