NOVOLAK DESIGN CONCEPT FOR HIGH-PERFORMANCE POSITIVE PHOTORESISTS

被引：16

作者：

HANABATA, M

OI, F

FURUTA, A

机构：

[1] Osaka Research Laboratory, Sumitomo Chemical Co, Ltd., Osaka City, Osaka, 554, Konohanaku

来源：

POLYMER ENGINEERING AND SCIENCE | 1992年 / 32卷 / 20期

关键词：

D O I：

10.1002/pen.760322009

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Novolak resins have been optimized for high performance positive photoresists. Low molecular weight novolak resins are the key components for improving resolution capability, sensitivity, and heat resistance of positive photoresists. Various phenolic compounds (monomers) and oligomers of metacresol novolak resins were evaluated as low molecular weight components. It was found that phenolic compounds that have moderate hydrophobicity and azocoupling capability with diazonaphthoquinone compounds greatly improve positive photoresist performance. This is explained in terms of the Stone wall model for positive photoresist development.

引用

页码：1494 / 1499

页数：6

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