METAL CONTACTS TO SILICON AND INDIUM-PHOSPHIDE CLEAVED SURFACES AND THE INFLUENCE OF INTERMEDIATE ADSORBED LAYERS

被引：108
作者：
WILLIAMS, RH
VARMA, RR
MONTGOMERY, V
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 05期
关键词：
D O I：
10.1116/1.570214
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1418 / 1421
页数：4
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