A MECHANISM FOR GROWTH ON DIAMOND (110) FROM ACETYLENE

被引:78
作者
BELTON, DN
HARRIS, SJ
机构
[1] Physical Chemistry Department, General Motors Research Laboratories, Warren
关键词
D O I
10.1063/1.462033
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have proposed a detailed chemical kinetics mechanism for the addition of C2H2 to a (110) diamond surface, which is the fastest growing face. The model contains no adjustable parameters and is based on the hypothesis that diamond surface chemistry may be understood in analogy with gas-phase hydrocarbon chemistry. We calculated a growth rate of 0.03-mu-m/h, which gives order-of-magnitude agreement with experiments and suggests we have a feasible mechanism for growth on (110) surfaces.
引用
收藏
页码:2371 / 2377
页数:7
相关论文
共 37 条
[1]  
BENSON SW, 1976, THEMROCHEMICAL KINET
[2]   HYDROGEN-ATOM DETECTION IN THE FILAMENT-ASSISTED DIAMOND DEPOSITION ENVIRONMENT [J].
CELII, FG ;
BUTLER, JE .
APPLIED PHYSICS LETTERS, 1989, 54 (11) :1031-1033
[3]   INFRARED DETECTION OF GASEOUS SPECIES DURING THE FILAMENT-ASSISTED GROWTH OF DIAMOND [J].
CELII, FG ;
PEHRSSON, PE ;
WANG, HT ;
BUTLER, JE .
APPLIED PHYSICS LETTERS, 1988, 52 (24) :2043-2045
[4]  
CELII FG, 1988, AIP C P, V191
[5]   MECHANISM OF DIAMOND FILM GROWTH BY HOT-FILAMENT CVD - C-13 STUDIES [J].
CHU, CJ ;
DEVELYN, MP ;
HAUGE, RH ;
MARGRAVE, JL .
JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) :2405-2413
[6]   DETAILED SURFACE AND GAS-PHASE CHEMICAL-KINETICS OF DIAMOND DEPOSITION [J].
FRENKLACH, M ;
WANG, H .
PHYSICAL REVIEW B, 1991, 43 (02) :1520-1545
[7]   THE ROLE OF HYDROGEN IN VAPOR-DEPOSITION OF DIAMOND [J].
FRENKLACH, M .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (12) :5142-5149
[8]   GROWTH-MECHANISM OF VAPOR-DEPOSITED DIAMOND [J].
FRENKLACH, M ;
SPEAR, KE .
JOURNAL OF MATERIALS RESEARCH, 1988, 3 (01) :133-140
[9]  
GEISS M, 1989, UNPUB FAL M BOST
[10]   NUMERICAL MODELING OF THE FILAMENT-ASSISTED DIAMOND GROWTH ENVIRONMENT [J].
GOODWIN, DG ;
GAVILLET, GG .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (12) :6393-6400