TOTAL REFLECTION PIXE - A VERY SENSITIVE TECHNIQUE FOR SURFACE-ANALYSIS

被引：12
作者：
VIS, RD
VANLANGEVELDE, F
机构：
[1] Department of Physics and Astronomy, Free University, Amsterdam
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 61卷 / 04期
关键词：
D O I：
10.1016/0168-583X(91)95331-7
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Experiments were performed to investigate the usefulness of proton beams under glancing angles incident on samples for surface analysis. It was observed that for incident angles in the order of a few mrad, the X-ray yield caused by proton induced X-ray emission (PIXE) increases more than could be explained by geometrical factors. An explanation is proposed including a mechanism in which protons are totally reflected from the surface, analogous to the well-known total reflection X-ray fluorescence (TXRF), where X-rays incident below the critical angle are used to increase peak to background ratios for surface analysis.
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页码：515 / 521
页数：7
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