EFFECT OF RE-ANODIZATION ON EXOELECTRON EMISSION OF ANODIC TA2O5 FILMS

被引：2

作者：

NANTO, H

KAWANISHI, M

机构：

[1] Institute of Scientific and Industrial Research, Osaka University

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 51卷 / 01期

关键词：

D O I：

10.1002/pssa.2210510120

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of reanodization on the thermally stimulated exoelectron emission (TSEE) from anodic Ta2O5 films is investigated. The thickness dependence of TSEE indicates that oxygen vacancies induced by heat treatment in the oxide film play the role of the emission‐active centres. It is confirmed by the reanodization technique that the distributions of oxygen vacancies are expressed by two exponentials. The mean attenuation length of exoelectrons (L) and the attenuation constants of oxygen vacancy distributions (μi and μs) are estimated experimentally. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA

引用

页码：191 / 196

页数：6

共 17 条

[1]

FITTING HJ, 1976, 5 P INT S EX EM DOS, P292

[2]

GLAEFEKE H, 1973, 6 P INT S EX EM DOS, P114

[3] DIFFUSION CONTROLLED EXOELECTRON-EMISSION (EEE) PHENOMENA IN BEO [J].