DESIGN AND ANALYSIS OF DIFFRACTION MIRROR OPTICS FOR EUV PROJECTION LITHOGRAPHY

被引：2

作者：

FUKUDA, H

TERASAWA, T

机构：

[1] Central Research Laboratory, Hitachi, Ltd. Kokubunji, Tokyo

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)00097-E

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Reflective gratings on a sphere are used instead of aspheric mirrors in soft X-ray projection lithography. In doing so, typical three-mirror optics are converted into reflective grating optics. Ray tracing through the new grating optics shows a resolution of better than 0.1 mum, which is comparable to that of aspheric mirror optics. Although there are problems with chromatic aberration and diffraction efficiency, this approach relaxes the stringent accuracy requirements of aspheric mirror optics for soft X-ray projection lithography.

引用

页码：239 / 242

页数：4

共 7 条

[1]

Kinoshita, Soft x-ray reduction lithography using multilayer mirrors, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, (1989)

[2]

Bjorkholm, Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 8 B, (1990)

[3]

Nagata, Fabrication of0.1 µmLine-and-Space Patterns using Soft X-Ray Reduction Lithography, Japanese Journal of Applied Physics, 33, (1993)

[4]

Itou, OSA Proc. Soft-x-ray Projection Lithography, 12, (1991)

[5]

Kurihara, Soft X-ray reduction optical system design for 0.1.MU.m lithography., Journal of Photopolymer Science and Technology, 5, (1992)

[6]

Estler, Evans, OSA Proc. Soft-x-ray Projection Lithography, 12, (1991)

[7]

Stern, Fabricating binary optics: Process variables critical to optical efficiency, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, (1991)

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