共 50 条
- [31] Comparison of inductively coupled plasma Cl2 and Cl 4/H2 etching of III-nitrides [J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1998, 16 (03): : 1631 - 1635
- [34] Comparison of inductively coupled plasma Cl2 and Cl4/H2 etching of III-nitrides [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1631 - 1635
- [37] CLOSED-CYCLE HCL/H2/CL2 ENERGY-STORAGE SYSTEM USING A CU/CUCL CATALYST [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1993, 206 : 43 - INOR