LOW-ENERGY AUGER-ELECTRON TRANSITIONS AND 4D EXCITATIONS OF EU, GD AND TB

被引：6

作者：

KOLACZKIEWICZ, J ^{[1
]}

BAUER, E ^{[1
]}

机构：

[1] TECH UNIV CLAUSTHAL,INST PHYS,W-3392 CLAUSTHAL ZELLERFE,GERMANY

来源：

SURFACE SCIENCE | 1992年 / 273卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(92)90279-F

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Electron energy-loss spectra related to 4d excitations are presented. Also low-energy Auger transitions involving 4d, 5p and 4f hole recombinations are studied. Special attention was paid to the direct recombination process of the 5p and 4f levels to solve the questions concerning interpretation of the energy losses attributed to the excitation of those levels. It was explained that changes of the slope of the Auger amplitude versus coverage (AA(theta)) lines recorded for the minimum of the work function are due to appearance of new recombination channels of the 4d levels.

引用

页码：109 / 120

页数：12

共 50 条

[41] LOW-ENERGY ELECTRON-DIFFRACTION, AUGER-ELECTRON SPECTROSCOPY, AND ELECTRON ENERGY-LOSS SPECTROSCOPY STUDIES OF GAAS(511) AND GAAS(711) SURFACES
YOUNG, K
KAHN, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 654 - 655
[42] CHARACTERIZATION AND COMPARISON OF AUGER-ELECTRON SPECTROSCOPY AND LOW-ENERGY ELECTRON-DIFFRACTION OF MONO-CRYSTALLINE, AMORPHOUS AND HYDROGENATED SILICON
ALLIE, G
LAUROZ, C
CHENEVASPAULE, A
[J]. APPLIED SURFACE SCIENCE, 1980, 4 (02) : 221 - 233
[43] Direct evidence for low-energy electron emission following O LVV Auger transitions at oxide surfaces
Alexander J. Fairchild
Varghese A. Chirayath
Philip A. Sterne
Randall W. Gladen
Ali R. Koymen
Alex H. Weiss
[J]. Scientific Reports, 10
[44] AUGER-ELECTRON SPECTROSCOPY, ELECTRON LOSS SPECTROSCOPY AND LOW-ENERGY ELECTRON-DIFFRACTION OF OXYGEN AND CARBON-MONOXIDE ADSORPTION ON PD FILMS
VOOK, RW
DECOOMAN, BC
VANKAR, VD
[J]. SCANNING ELECTRON MICROSCOPY, 1983, : 1635 - 1641
[45] Direct evidence for low-energy electron emission following O LVV Auger transitions at oxide surfaces
Fairchild, Alexander J.
Chirayath, Varghese A.
Sterne, Philip A.
Gladen, Randall W.
Koymen, Ali R.
Weiss, Alex H.
[J]. SCIENTIFIC REPORTS, 2020, 10 (01)
[46] LOW-ENERGY AUGER TRANSITIONS OF BORON IN SEVERAL BORON-COMPOUNDS
HANKE, G
MULLER, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 964 - 968
[47] CHARACTERIZATION OF AMORPHOUS SILICON-OXIDE AND SILICON-NITRIDE FILMS BY AUGER-ELECTRON SPECTROSCOPY AND LOW-ENERGY ELECTRON LOSS SPECTROSCOPY
HEZEL, R
LIESKE, N
[J]. THIN SOLID FILMS, 1979, 58 (02) : 297 - 297
[48] POSITRON-ANNIHILATION INDUCED AUGER-ELECTRON SPECTROSCOPY AND ITS IMPLEMENTATION AT ACCELERATOR BASED LOW-ENERGY POSITRON FACTORIES
WEISS, A
KOYMEN, AR
MEHL, D
LEE, KH
YANG, G
JENSEN, K
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 56-7 : 591 - 594
[49] A LOW-ENERGY ELECTRON-DIFFRACTION - AUGER-ELECTRON SPECTROSCOPY STUDY OF ALLOY FORMATION DURING THE ADSORPTION OF TIN ON (100) AND (111) AU
BARTHES, MG
PARISET, C
[J]. THIN SOLID FILMS, 1981, 77 (04) : 305 - 312
[50] ADSORPTION OF BENZENE ON PT(111) SURFACE STUDIED BY LOW-ENERGY ELECTRON-DIFFRACTION INTENSITY MEASUREMENTS AND QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY
STAIR, PC
SOMORJAI, GA
[J]. JOURNAL OF CHEMICAL PHYSICS, 1977, 67 (10) : 4361 - 4369

← 1 2 3 4 5 →