HOLE REFRACTION FROM STRAINED SI1-XGEX/SI HETEROSTRUCTURES

被引:5
作者
SANCHEZ, AD [1 ]
PROETTO, CR [1 ]
机构
[1] COMIS NACL ENERGIA ATOM,INST BALSEIRO,RA-8400 BARILOCHE,RIO NEGRO,ARGENTINA
来源
PHYSICAL REVIEW B | 1995年 / 51卷 / 23期
关键词
D O I
10.1103/PhysRevB.51.17199
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The scattering problem of holes impinging towards Si1-xGex/Si heterointerfaces has been analyzed, within the envelope-function approach to the effective-mass approximation. A block-diagonalized 6×6 Luttinger-Kohn Hamiltonian is used to describe the dynamics of holes, which incorporates the mixing among the heavy-, light-, and spin-split-off hole bands, nonparabolicity, anisotropy, and built-in strain effects. Interesting anomalous reflectivities and transmissivities are found at certain threshold incident energies where any of the reflected or transmitted holes pass from evanescent to propagating. A generalization of the scattering-matrix formalism yields the symmetry relations among the reflection and transmission coefficients. © 1995 The American Physical Society.
引用
收藏
页码:17199 / 17202
页数:4
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