COATING, MECHANICAL CONSTRAINTS, AND PRESSURE EFFECTS ON ELECTROMIGRATION

被引：60

作者：

AINSLIE, NG

WELLS, OC

DHEURLE, FM

机构：

来源：

关键词：

D O I：

10.1063/1.1654097

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：173 / &

共 15 条

[1] ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS [J].

ATTARDO, MJ ;

ROSENBERG, R .

[2]

BEYELER M, 1970, MEM ETUD SCI REV MET, V67, P395

[3]

BEYELER M, 1965, PHYSICS SOLIDS HIGH, P367

[4]

BLACK JR, 1969, IEEE T ELECTRON DEVI, VED16, P338

[5] ELECTROMIGRATION-INDUCED FAILURES IN ALUMINUM FILM CONDUCTORS [J].

BLAIR, JC ;

GHATE, PB ;

HAYWOOD, CT .

[6]

D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108

[7]

EMERICK RM, 1961, PHYS REV, V122, P1720

ENGARDT, RD ;

BARNES, RG .

PHYSICAL REVIEW B-SOLID STATE, 1971, 3 (08) :2391-&

[9]

LEARN AJ, 1971, 9 P ANN IEEE REL PHY, P129

[10] CURRENT-INDUCED MASS TRANSPORT IN ALUMINUM [J].

PENNEY, RV .