JOSEPHSON JUNCTION FABRICATION BY MEANS OF ION-IMPLANTATION AND ELECTRON-BEAM LITHOGRAPHY

被引：0
作者：
GAMO, K
NAMBA, S
机构：
来源：
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1980年 / 47卷 / 1-4期
关键词：
D O I：
10.1080/00337578008209206
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
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页码：171 / 176
页数：6
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