DEPTH RESOLUTION FOR SPUTTER SECTIONING OF NI

被引：1
|
作者：
MACHT, MP
WILLECKE, R
NAUNDORF, V
机构：
[1] Hahn-Meitner-Institut Berlin GmbH, 1000 Berlin 39
来源：
VACUUM | 1990年 / 41卷 / 7-9期
关键词：
D O I：
10.1016/0042-207X(90)94051-Q
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The depth resolution function for sputter sectioning of nickel was quantitatively investigated with respect to its dependence on primary ion energy, current density, and on temperature. The depth resolution is independent of current density and of temperature below 500 K and worsens with increasing sputter energy. At elevated temperatures a further deterioration of depth resolution was observed which could be quantitatively attributed to radiation-enhanced diffusion. The results will be discussed within a diffusion model of depth resolution and the contributions of atomic mixing and surface roughening will be separated.
引用
收藏
页码：1674 / 1675
页数：2
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