DEPTH RESOLUTION FOR SPUTTER SECTIONING OF NI

The depth resolution function for sputter sectioning of nickel was quantitatively investigated with respect to its dependence on primary ion energy, current density, and on temperature. The depth resolution is independent of current density and of temperature below 500 K and worsens with increasing sputter energy. At elevated temperatures a further deterioration of depth resolution was observed which could be quantitatively attributed to radiation-enhanced diffusion. The results will be discussed within a diffusion model of depth resolution and the contributions of atomic mixing and surface roughening will be separated.