ELECTRICAL RESPONSE OF A BIMETALLIC JUNCTION TO SHOCK COMPRESSION

被引:20
作者
BLOOMQUIST, DD
DUVALL, GE
DICK, JJ
机构
[1] WASHINGTON STATE UNIV, PULLMAN, WA 99164 USA
[2] UNIV CALIF LOS ALAMOS SCI LAB, LOS ALAMOS, NM 87545 USA
关键词
D O I
10.1063/1.326548
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrical response of a copper-Constantan junction to shock compression has been studied over a pressure range 14.5-36.0 GPa. Four possible sources of anomalous response were found: electrical noise due to circuit closure at impact, shock demagnetization of a ferromagnetic material, high local temperature at the junction interface due to shock compression of a surface damage layer, and two-dimensional flow in the pressurized region due to pressure relief from the edges. Using a diffusion-welded junction in uniaxial strain the emf measured is within 20% of the predicted emf based on normal thermocouple response to shock-compression temperatures. In a geometry in which a guard ring was used to prevent lateral flow behind the shock front, the observed voltage-time profile was a step with constant plateau. In a similar configuration where radial pressure relief was allowed behind the shock front, the initial step (which compares directly in amplitude to the above results) is followed by a marked positive ramping. This ramping was directly correlated with the two-dimensional flow due to radial pressure relief. The results indicate that any fundamental anomaly which exists for one-dimensional strain is less than 10-20% of the observed signals in the pressure range studied.
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页码:4838 / 4846
页数:9
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