SURFACE-DIFFUSION AND ADATOM STOICHIOMETRY IN GAAS MBE STUDIED BY MICROPROBE-RHEED/SEM MBE

被引:16
|
作者
NISHINAGA, T
SHEN, XQ
机构
[1] Department of Electronic Engineering, Faculty of Engineering, The University of Tokyo, Bunkyoku, Tokyo, 113
关键词
D O I
10.1016/0169-4332(94)90210-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The incorporation diffusion length of surface migrating adatoms, lambda(inc), is studied theoretically and experimentally taking GaAs MBE as an example. By using microprobe-RHEED/SEM MBE equipment, it is demonstrated that lambda(inc) depends strongly on the As pressure and takes a value of the order of 1 mum. This behavior is explained by assuming that the Ga flux entering the step exceeds that of As. On the other hand, when the Ga flux entering the step is less than that of As, lambda(inc) decreases to take the value of step separation which is typically of the order of a few tens of nm. It is concluded that the balance of Ga and As fluxes entering the step edge governs the incorporation diffusion length of Ga.
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页码:141 / 148
页数:8
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