PREPARATION OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST (SPP) AND ITS APPLICATION TO AN IMAGE REVERSAL PROCESS

被引：0
|
作者：
TANAKA, A [1 ]
BAN, H [1 ]
IMAMURA, S [1 ]
机构：
[1] NIPPON TELEGRAPH & TEL PUBL CORP, LSI LABS, ATSUGI, KANAGAWA 24301, JAPAN
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1989年 / 197卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：76 / PMSE
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