DOPING OF SILICON BY PULSED ELECTRON-BEAM ANNEALING OF DEPOSITED LAYERS

被引：0
作者：
MAENPAA, M
LAU, SS
VONALLMEN, M
GOLECKI, I
NICOLET, MA
MINNUCCI, J
机构：
[1] CALTECH,PASADENA,CA 91125
[2] SPIRE CORP,BEDFORD,MA 01730
来源：
THIN SOLID FILMS | 1980年 / 67卷 / 02期
关键词：
D O I：
10.1016/0040-6090(80)90462-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：293 / 297
页数：5
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