MAGNETIC AND STRUCTURAL-PROPERTIES OF SPUTTERED FE-N THIN-FILMS

被引：8

作者：

BOBO, JF

VERGNAT, M

CHATBI, H

HENNET, L

LENOBLE, O

BAUER, P

PIECUCH, M

机构：

[1] CNRS - UMR 37, Laboratoire de Métallurgie Physique et Sciences des Matériaux, URA 155, 54506 Vandoeuvre-les-Nancy Cedex

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 140卷

关键词：

D O I：

10.1016/0304-8853(94)01570-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fe-N thin films have been deposited by reactive rf sputtering in an N-2-Ar atmosphere onto substrates maintained at room temperature. The evolutions of the crystallographic structures and of the magnetic properties are discussed versus the nitrogen concentration in the gaseous flow.

引用

页码：717 / 718

页数：2