ARSENIC ION CHANNELING THROUGH SINGLE-CRYSTAL SILICON

被引：8
|
作者：
WADA, Y
NISHIMATSU, S
HASHIMOTO, N
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期
关键词：
D O I：
10.1149/1.2129619
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：206 / 210
页数：5
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