ULTRA-LOW MOMENTUM ANTIPROTONS IN LEAR

被引:0
|
作者
BAIRD, S
BOSSER, J
CHANEL, M
LEFEVRE, P
LEY, R
MANGLUNKI, D
MOHL, D
TRANQUILLE, G
机构
关键词
D O I
暂无
中图分类号
O57 [原子核物理学、高能物理学];
学科分类号
070202 ;
摘要
Limitations to the antiproton beam intensities that are decelerated and stored in LEAR are examined, and expectations for machine performance in the momentum range at and below 105 MeV/c are given. These estimates are compared with the current machine performance. The various modes of beam extraction at low momentum are reviewed and some estimations are given for fast extraction efficiencies.
引用
收藏
页码:C635 / C644
页数:10
相关论文
共 50 条
  • [41] Ultra-Low PowerDesign Approaches for IoT
    Alioto, Massimo
    2014 IEEE HOT CHIPS 26 SYMPOSIUM (HCS), 2014,
  • [42] Process ultra-low sulfur diesel
    Mayo, S
    Brevoord, E
    Gerritsen, L
    Plantenga, F
    HYDROCARBON PROCESSING, 2001, 80 (02): : 84A - +
  • [43] ULTRA-LOW FREQUENCY BALLISTOCARDIOGRAM OF MOUSE
    JUZNIC, G
    BIBLIOTHECA CARDIOLOGICA, 1970, (26) : 280 - &
  • [44] CREATE ULTRA-LOW DROPOUT REGULATOR
    SIMPSON, C
    ELECTRONIC DESIGN, 1993, 41 (12) : 74 - &
  • [45] Ultra-Low Latency Mobile Networking
    Chen, Kwang-Cheng
    Zhang, Tao
    Gitlin, Richard D.
    Fettweis, Gerhard
    IEEE NETWORK, 2019, 33 (02): : 181 - 187
  • [46] OPTICAL INTERFEROMETRY AT ULTRA-LOW TEMPERATURES
    HAKONEN, PJ
    ALLES, H
    BABKIN, AV
    RUUTU, JP
    JOURNAL OF LOW TEMPERATURE PHYSICS, 1995, 101 (1-2) : 41 - 47
  • [47] A Rejoinder in Favour of an Ultra-Low Chronology
    Warburton, David A.
    AKKADICA, 2013, 134 (01): : 17 - 28
  • [48] Nuclear demagnetization for ultra-low temperatures
    Abe, Satoshi
    Matsumoto, Koichi
    CRYOGENICS, 2014, 62 : 213 - 220
  • [49] The development of an ultra-low humidity instrumentation
    Fan, B
    Shu, T
    Wang, L
    ISTM/97 - 2ND INTERNATIONAL SYMPOSIUM ON TEST AND MEASUREMENT, CONFERENCE PROCEEDINGS, 1997, : 471 - 473
  • [50] Ultra-low energy imaging for metrology
    Joy, DC
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII, 1998, 3332 : 42 - 50