FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS

被引：60

作者：

HEIDENREICH, RD ^{[1
]}

THOMPSON, LF ^{[1
]}

FEIT, ED ^{[1
]}

MELLIARS.CM ^{[1
]}

机构：

[1] BELL LABS, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 09期

关键词：

D O I：

10.1063/1.1662892

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4039 / 4047

页数：9

共 22 条

[1]

ANGELLO SJ, AFALTR69204 AIR FORC

[2] EXPOSURE OF PHOTORESISTS - ELECTRON BEAM EXPOSURE OF NEGATIVE PHOTORESISTS [J].

BROYDE, B .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (09) :1241-&

[3] ELECTRON-SENSITIVE MATERIALS [J].

BROYDE, B .

BELL SYSTEM TECHNICAL JOURNAL, 1970, 49 (09) :2095-+

[4] MULTIPLE SCATTERING OF 5-30 KEV ELECTRONS IN EVAPORATED METAL FILMS 3 - BACKSCATTERING AND ABSORPTION [J].

COSSLETT, VE ;

THOMAS, RN .

BRITISH JOURNAL OF APPLIED PHYSICS, 1965, 16 (06) :779-&

[5] MULTIPLE SCATTERING OF 5-30 KEV ELECTRONS IN EVAPORATED METALS FILMS . 1 . TOTAL TRANSMISSION + ANGULAR DISTRIBUTION [J].

COSSLETT, VE ;

THOMAS, RN .

BRITISH JOURNAL OF APPLIED PHYSICS, 1964, 15 (08) :883-&

[6] THE PENETRATION OF ELECTRONS INTO LUMINESCENT MATERIAL [J].

EHRENBERG, W ;

FRANKS, J .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (408) :1057-1066

[7] PENETRATION OF ELECTRONS INTO LUMINESCENT MATERIALS [J].

EHRENBERG, W ;

KING, DEN .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1963, 81 (522) :751-&

[8] DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS [J].

EVERHART, TE ;

HOFF, PH .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) :5837-&

[9]

EVERHART TE, 1966, ELECTRON MICROSCOPY, V1

[10]

GRUN AE, 1957, Z NATURFORSCH PT A, V12, P89

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