CHEMICAL VAPOR-DEPOSITION OF REACTIVE ORGANOGERMANIUM FILMS BY LASER-INDUCED DECOMPOSITION OF TETRAMETHOXYGERMANE

被引：18

作者：

POLA, J

FAJGAR, R

BASTL, Z

DIAZ, L

机构：

[1] CZECHOSLOVAK ACAD SCI, J HEYROVSKY INST PHYS CHEM & ELECTROCHEM, CS-18223 PRAGUE, CZECHOSLOVAKIA

[2] CSIC, INST OPT, E-28006 MADRID, SPAIN

来源：

JOURNAL OF MATERIALS CHEMISTRY | 1992年 / 2卷 / 09期

关键词：

CHEMICAL VAPOR DEPOSITION; LASER-INDUCED DECOMPOSITION; THIN FILM; TETRAMETHOXYGERMANE;

D O I：

10.1039/jm9920200961

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Laser-induced multiphoton and SF6-photosensitised decomposition of tetramethoxygermane has been used for chemical vapour deposition of reactive organooxogermanium polymers, which were characterised by IR, VIS, and UV spectra and ESCA and TEM techniques. The properties of the deposited layers differed depending on the mode of tetramethoxygermane decomposition. The films were reactive towards the ambient atmosphere; this is discussed in terms of the reaction of CH3OGe groups with air moisture.

引用

页码：961 / 964

页数：4

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