COMBINED AUGER-ELECTRON SPECTROSCOPY AND ELECTRON-IMPACT DESORPTION STUDIES OF SILICON SURFACES

被引：11

作者：

NISHIJIM.M

MUROTANI, T

机构：

来源：

关键词：

D O I：

10.1016/0039-6028(72)90172-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：459 / &

共 6 条

[1] AUGER ELECTRON SPECTROSCOPY
CHANG, CC
[J]. SURFACE SCIENCE, 1971, 25 (01) : 53 - +
[2] CONTAMINANTS ON CHEMICALLY ETCHED SILICON SURFACES - LEED-AUGER METHOD
CHANG, CC
[J]. SURFACE SCIENCE, 1970, 23 (02) : 283 - &
[3] ELECTRON-STIMULATED DESORPTION AS A TOOL FOR STUDIES OF CHEMISORPTION - REVIEW
MADEY, TE
YATES, JT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (04): : 525 - &
[4] Many A., 1965, SEMICONDUCTOR SURFAC
[5] NISHIJIMA M, TO BE PUBLISHED
[6] The focusing of charged particles by a spherical condenser
Purcell, EM
[J]. PHYSICAL REVIEW, 1938, 54 (10): : 818 - 826