CORROSION RESISTANCE OF SEVERAL INTEGRATED-CIRCUIT METALLIZATION SYSTEMS

被引：62

作者：

CUNNINGHAM, JA

FULLER, CR

HAYWOOD, CT

机构：

来源：

关键词：

D O I：

10.1109/TR.1970.5216441

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：182 / +

页数：1

共 11 条

[1]

BERRY RW, 1968, THIN FILM TECHNOLOGY, P273

[2]

BRAUER JB, 1970, 8 ANN REL PHYS S LAS

[3]

Cunningham J. A., 1969, Ohmic contacts to semiconductors, P299

[4]

CUNNINGHAM JA, 1967, EL SOC EXT ABSTR, V4, P24

[5]

EYNON RT, 1968, EL SOC EXT ABSTR, V5, P245

[6]

GHATE PB, 1969, 1969 AIME M PHIL

[7] BEAM-LEAD TECHNOLOGY [J].

LEPSELTE.MP .

BELL SYSTEM TECHNICAL JOURNAL, 1966, 45 (02) :233-&

[8]

SCHNABLE GL, 1967, 6 ANN REL PHYS S LOS, P170

[9] METALLIZATION SYSTEMS FOR SILICON INTEGRATED CIRCUITS [J].

TERRY, LE ;

WILSON, RW .

[10] SLT DEVICE METALLURGY AND ITS MONOLITHIC EXTENSION [J].

TOTTA, PA ;

SOPHER, RP .