Corrosion Behavior of TiAlN film on AISI 4140 Steel

被引：0

作者：

Wongpinij, Thipusa ^{[1
]}

机构：

[1] Suranaree Univ Technol, SIP, 111 Univ Ave, Nakhon Ratchasima 30000, Thailand

来源：

JOURNAL OF METALS MATERIALS AND MINERALS | 2013年 / 23卷 / 02期

关键词：

TiAlN film; AISI; 4140; steel; NaCl solution; Electrochemical technique;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The corrosion behavior of uncoated and TiAlN coated on AISI 4140 steel were studied by an electrochemical technique in 3.5 wt% NaCl solution at pH value of 2, 7 and 10 at room temperature. The corrosion potential (Ecorr), pitting potential (Epit), corrosion rate (Rmmy) and passive region in polarization curves were analyzed and compared. After electrochemical testing, samples surface was characterized by scanning electron microscopy (SEM) with energy dispersive X-ray analysis (EDX) and X-ray photoemission electron microscopy (X-PEEM). The results indicated that the TiAlN coated samples yielded better corrosion resistance than the uncoated samples. The coated samples had lower corrosion rate (Rmmy) than uncoated samples at all pH condition. In addition, the TiAlN coated sample tested in solution at pH 7 showed the widest passive potential region.

引用

页码：59 / 65

页数：7

共 26 条

[1] DESIGN AND CHARACTERIZATION OF A COMPACT 2-TARGET ULTRAHIGH-VACUUM MAGNETRON SPUTTER DEPOSITION SYSTEM - APPLICATION TO THE GROWTH OF EPITAXIAL TI1-XALXN ALLOYS AND TIN/TI1-XALXN SUPERLATTICES [J].

ADIBI, F ;

PETROV, I ;

GREENE, JE ;

WAHLSTROM, U ;

SUNDGREN, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :136-142

[2] Effects of nitrogen flow rates on the growth morphology of TiA1N films prepared by an rf-reactive sputtering technique [J].

Chakrabarti, K ;

Jeong, JJ ;

Hwang, SK ;

Yoo, YC ;

Lee, CM .

THIN SOLID FILMS, 2002, 406 (1-2) :159-163

[3]

Christine T., 2005, P ASM MAT PROC MED D

[4] X-RAY-ABSORPTION SPECTROSCOPY AT THE FE L(2,3) THRESHOLD IN IRON-OXIDES [J].

CROCOMBETTE, JP ;

POLLAK, M ;

JOLLET, F ;

THROMAT, N ;

GAUTIERSOYER, M .

PHYSICAL REVIEW B, 1995, 52 (05) :3143-3150

[5]

Duh J. Gong, 2008, J ELECTROANAL CHEM, V618, P45

[6] XAS study on the intermediate species formed during the surface oxidation of CrN films [J].

Esaka, F ;

Furuya, K ;

Shimada, H ;

Imamura, M ;

Matsubayashi, N ;

Sato, T ;

Nishijima, A ;

Kikuchi, T ;

Kawana, A ;

Ichimura, H .

JOURNAL DE PHYSIQUE IV, 1997, 7 (C2) :1149-1150

[7] The probing depth of total electron yield in the sub-keV range: TEY-XAS and X-PEEM [J].

Frazer, BH ;

Gilbert, B ;

Sonderegger, BR ;

De Stasio, G .

SURFACE SCIENCE, 2003, 537 (1-3) :161-167

[8]

Gaute S., 2003, CORROSION ALUMINIUM

[9] Polarized OK edge spectra of Fe2O3 (0001) nanometric films:: A full multiple scattering interpretation [J].

Guiot, E ;

Wu, ZY ;

Gota, S ;

Gautier-Soyer, M .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1999, 101 :371-375

[10] Fe L-edge XAS studies of K4[Fe(CN)6] and K3[Fe(CN)6]:: A direct probe of back-bonding [J].

Hocking, Rosalie K. ;

Wasinger, Erik C. ;

de Groot, Frank M. F. ;

Hodgson, Keith O. ;

Hedman, Britt ;

Solomon, Edward I. .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2006, 128 (32) :10442-10451

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