KINETICS AND MECHANISMS OF CW-LASER INDUCED DEPOSITION OF METALS FOR MICROELECTRONICS

被引：9
作者：
AUVERT, G
机构：
来源：
APPLIED SURFACE SCIENCE | 1989年 / 43卷
关键词：
D O I：
10.1016/0169-4332(89)90189-X
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：47 / 53
页数：7
相关论文
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