SUBSHELL PHOTOIONIZATION OF XE BETWEEN 40 AND 1000EV

被引：178

作者：

BECKER, U

SZOSTAK, D

KERKHOFF, HG

KUPSCH, M

LANGER, B

WEHLITZ, R

YAGISHITA, A

HAYAISHI, T

机构：

[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN

[2] UNIV TSUKUBA,INST APPL PHYS,SAKURA,IBARAKI 305,JAPAN

来源：

PHYSICAL REVIEW A | 1989年 / 39卷 / 08期

关键词：

D O I：

10.1103/PhysRevA.39.3902

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3902 / 3911

页数：10

共 56 条

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