PHOTOCHEMICAL MICROPATTERNING OF SILYLATED GLASS-SURFACE BEARING 3-PHENYLDITHIOPROPYL GROUP BY KRF LASER IRRADIATION

Thin film of 3-phenyldithiopropyltrimethoxysilane (1) was prepared as a photoreactive surface of masked thiol by in-situ reaction of 3-mercaptopropyltrimethoxysilane (2) with diphenyldisulfide before deposition of the film on quartz substrate. The film of 1 undergoes photochemical oxygenation of sulfur atom more efficiently than that of 2 upon KrF laser (248 nm) irradiation, where a thiyl radical is incorporated as a common intermediate.