NEW HIGH-TEMPERATURE STABLE POSITIVE PHOTORESISTS BASED ON HYDROXY POLYIMIDES AND POLYAMIDES CONTAINING THE HEXAFLUOROISOPROPYLIDENE (6-F) LINKING GROUP

被引:67
作者
KHANNA, DN
MUELLER, WH
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D O I
10.1002/pen.760291414
中图分类号
TQ [化学工业];
学科分类号
0817 ;
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页码:954 / 959
页数:6
相关论文
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