EXCIMER LASER-INDUCED OXIDATION OF ION-IMPLANTED SILICON

被引：9
|
作者：
FOGARASSY, E
WHITE, CW
SLAOUI, A
FUCHS, C
SIFFERT, P
PENNYCOOK, SJ
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 18期
关键词：
D O I：
10.1063/1.99805
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1720 / 1722
页数：3
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