SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES

被引：8

作者：

JENNINGS, TA

MCNEILL, W

机构：

来源：

关键词：

D O I：

10.1063/1.1651877

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：25 / &

共 8 条

[1]

JENNINGS TA, 1967, J ELECTROCHEM SOC, V114, P1133

[2] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES [J].

LIGENZA, JR .

MILES, JL ;

SMITH, PH .

[4]

ROCKWOOD GH, 1941, A I E E TECHNICAL PA, P4

[5] ION BALANCE OF OXYGEN DC GLOW DISCHARGE [J].

THOMPSON, JB .

[6] PLASMA ANODIZED ALUMINUM OXIDE FILMS [J].

TIBOL, GJ ;

HULL, RW .

[7] LOW-ENERGY SPUTTERING YIELDS IN HG [J].

WEHNER, GK .

PHYSICAL REVIEW, 1958, 112 (04) :1120-1124

[8] OXIDE FILMS GROWN ON GAAS IN AN OXYGEN PLASMA [J].

WEINREICH, OA .