ELASTIC-CONSTANTS AND THERMAL-EXPANSION COEFFICIENT OF METASTABLE C49 TISI2

被引:37
作者
JONGSTE, JF
LOOPSTRA, OB
JANSSEN, GCAM
RADELAAR, S
机构
[1] DIMES, Section Submicron Technology, Delft University of Technology, 2600 GA Delft
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.353058
中图分类号
O59 [应用物理学];
学科分类号
摘要
The elastic constants and thermal expansion coefficient of C49 TiSi2 thin films have been investigated by in situ curvature measurement during heat treatment and ex situ x-ray diffraction measurementS. The C49 TiSi2 compound was formed from Ti-Si multilayers deposited on monocrystalline silicon and sapphire substrates. The films were polycrystalline without any evident texture. Young's modulus (142 GPa), Poisson's ratio (0.27), and the thermal expansion coefficient (10.9 x 10(-6) K-1) have been determined. Note that these values are averages over random crystal orientations. Directly after formation C49 TiSi2 films exhibit tensile stress. This stress relaxes considerably above 375-degrees-C. Below this temperature the thermal expansion is found to be independent of the state of relaxation of the C49 TiSi2 film.
引用
收藏
页码:2816 / 2820
页数:5
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