AN ELLIPSOMETRIC STUDY OF THIN-FILMS ON SILICA PLATES FORMED BY ALKYLCHLOROSILYLATION REAGENTS

被引：80

作者：

TRAU, M ^{[1
]}

MURRAY, BS ^{[1
]}

GRANT, K ^{[1
]}

GRIESER, F ^{[1
]}

机构：

[1] UNIV MELBOURNE, SCH CHEM, COLLOID & SURFACE CHEM GRP, PARKVILLE, VIC 3052, AUSTRALIA

来源：

JOURNAL OF COLLOID AND INTERFACE SCIENCE | 1992年 / 148卷 / 01期

关键词：

D O I：

10.1016/0021-9797(92)90126-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The hydrophobic films produced on vitreous silica plates following solution silylation with some mono-, di-, and trichloroalkylsilylation reagents have been measured using an ellipsometric technique. It is found that all treatments produce greater than monolayer surface films, with the thickest films being formed from trichloroalkylsilylating reagents. A comparison between the silylated films and an esterified film clearly shows the superiority of the latter bonded surface in terms of compositional uniformity and low thickness. © 1992.

引用

页码：182 / 189

页数：8

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