DEPENDENCE OF ELECTRON-CYCLOTRON RESONANCE PLASMA CHARACTERISTICS ON MAGNETIC-FIELD PROFILES

被引：1

作者：

SAMUKAWA, S ^{[1
]}

NAKAMURA, T ^{[1
]}

机构：

[1] NEC CORP LTD, MECHATRON RES LAB, MIYAMAE KU, KAWASAKI, KANAGAWA 213, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 7B期

关键词：

ECR PLASMA ETCHING; ECR POSITION; MAGNETIC FIELD PROFILE; MAGNETIC FIELD GRADIENT; ION ENERGY;

D O I：

10.1143/JJAP.30.L1330

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Ion energy distribution is influenced by the magnetic field profiles in electron cyclotron resonance (ECR) plasma. When a 875 G equi-magnetic field is nonuniform, the microwave absorption concentrates at the ECR position which is located near the microwave window. Then, the mean ion energy distribution on the substrate holder becomes much broader due to the ion acceleration by the plasma potential difference. In addition, the ion energy distribution depends on the uniformity of the magnetic field gradient at the ECR position. The microwave is absorbed efficiently around the small gradient ECR position. Therefore, a uniform magnetic field gradient at the ECR position causes a uniform and sharp ion energy distribution.

引用

页码：L1330 / L1332

页数：3

共 19 条

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