ELECTRON NUMBER DENSITY STUDIES IN MODERATE-POWER ARGON AND HELIUM MICROWAVE-INDUCED PLASMAS

被引：23

作者：

BROWN, PG ^{[1
]}

BROTHERTON, TJ ^{[1
]}

WORKMAN, JM ^{[1
]}

CARUSO, JA ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT CHEM,CINCINNATI,OH 45221

来源：

APPLIED SPECTROSCOPY | 1987年 / 41卷 / 05期

关键词：

D O I：

10.1366/0003702874448175

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：774 / 779

页数：6

共 21 条

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[2]

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[4] INFLUENCE OF FLOW-RATE AND PRESSURE ON EXCITATION CONDITIONS IN LOW-PRESSURE MICROWAVE INDUCED PLASMAS [J].

BRASSEM, P ;

MAESSEN, FJMJ .

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[5] ELECTRON TEMPERATURES AND ELECTRON CONCENTRATIONS AT LOW-PRESSURE IN MICROWAVE INDUCED PLASMAS [J].

BRASSEM, P ;

MAESSEN, FJM .

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[6]

BRASSEM P, 1976, SPECTROCHIM ACTA B, V31, P485

[7] SPECTROSCOPIC TEMPERATURES OF A MODERATE-POWER ARGON MICROWAVE-INDUCED PLASMA [J].

BROWN, PG ;

WORKMAN, JM ;

HAAS, DL ;

FLEITZ, PA ;

MILLER, DC ;

SELISKAR, CJ ;

CARUSO, JA .

APPLIED SPECTROSCOPY, 1986, 40 (04) :477-483

[8] FUNDAMENTAL PROPERTIES CHARACTERIZING LOW-PRESSURE MICROWAVE-INDUCED PLASMAS AS EXCITATION SOURCES FOR SPECTROANALYTICAL CHEMISTRY [J].

BUSCH, KW ;

VICKERS, TJ .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1973, B 28 (03) :85-104

[9]

CARUSO JA, 1987, SPECTROCHIM ACTA B, V42

[10]

CHEN FF, 1984, INTRO PLASMA PHYSICS, V1, P8

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