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ELECTRONIC-STRUCTURE STUDY OF THE NI-GA AND THE NI-IN INTERMETALLIC COMPOUNDS USING X-RAY PHOTOEMISSION SPECTROSCOPY
被引:62
|作者:
HSU, LS
[1
]
WILLIAMS, RS
[1
]
机构:
[1] UNIV CALIF LOS ANGELES, DEPT CHEM & BIOCHEM, LOS ANGELES, CA 90024 USA
关键词:
X-RAY PHOTOEMISSION SPECTROSCOPY;
NI-GA AND NI-IN INTERMETALLIC COMPOUNDS;
ELECTRONIC STRUCTURE;
D O I:
10.1016/0022-3697(94)90226-7
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Polycrystalline Ni-Ga and Ni-In intermetallic compounds of various stoichiometric compositions have been examined by X-ray photoemission spectroscopy. The observed valence-band spectra for all the compounds are very similar to those for elemental Ni; those for Ni3Ga and NiIn agree rather well with the band-structure calculations of Kubo and Wakch [Kubo and Wakch, J. Phys. F17, 397 (1987)] and Colinet et al. [Colinet, Bessoud and Pasturel, Z. Metallkd 77, 798 (1986)], respectively. Only a partial filling of the empty Ni 3d states occurs on forming compounds with Ga or In.
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页码:305 / 312
页数:8
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