ELECTRONIC-STRUCTURE STUDY OF THE NI-GA AND THE NI-IN INTERMETALLIC COMPOUNDS USING X-RAY PHOTOEMISSION SPECTROSCOPY

被引：62

作者：

HSU, LS ^{[1
]}

WILLIAMS, RS ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES, DEPT CHEM & BIOCHEM, LOS ANGELES, CA 90024 USA

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1994年 / 55卷 / 04期

关键词：

X-RAY PHOTOEMISSION SPECTROSCOPY; NI-GA AND NI-IN INTERMETALLIC COMPOUNDS; ELECTRONIC STRUCTURE;

D O I：

10.1016/0022-3697(94)90226-7

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Polycrystalline Ni-Ga and Ni-In intermetallic compounds of various stoichiometric compositions have been examined by X-ray photoemission spectroscopy. The observed valence-band spectra for all the compounds are very similar to those for elemental Ni; those for Ni3Ga and NiIn agree rather well with the band-structure calculations of Kubo and Wakch [Kubo and Wakch, J. Phys. F17, 397 (1987)] and Colinet et al. [Colinet, Bessoud and Pasturel, Z. Metallkd 77, 798 (1986)], respectively. Only a partial filling of the empty Ni 3d states occurs on forming compounds with Ga or In.

引用

页码：305 / 312

页数：8

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