THE ELECTRICAL-CONDUCTIVITY OF COPPER AND TIN THIN-FILMS VACUUM-DEPOSITED IN A LATERAL ELECTRIC-FIELD

被引：3
|
作者：
DAS, VD
GOPALAKRISHNAN, S
机构：
来源：
THIN SOLID FILMS | 1981年 / 81卷 / 02期
关键词：
D O I：
10.1016/0040-6090(81)90299-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：131 / 135
页数：5
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