THE INFLUENCE OF GAAS CRYSTAL COMPOSITION ON THE FEATURES OF MATRIX MICRODEFECTS

被引:7
作者
CHARNIY, L
BUBLIK, V
机构
[1] Department of Semiconductor Materials and Devices, Moscow Steel and Alloys Institute, 117936 Moscow
关键词
D O I
10.1016/0022-0248(94)90756-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Associations of intrinsic point defects in as-grown LEC and HB GaAs single crystals undoped and doped with In, Si, Te and Zn have been studied. Dislocation loops as well as clusters of intrinsic point defects, which were not visible in TEM, were revealed and investigated by an X-ray diffuse scattering method. The maximum number of interstitial atoms forming these microdefects was not more than 10(17) CM-3. We found that interstitials forming the diffuse ''clouds'' coagulated into dislocation loops in GaAs doped with donor impurities when the free electron concentration n was more than n(c) = 3 x 10(18) CM3, thus increasing the supersaturation of arsenic interstitials in crystals and leading to an increase in the value of n(c). The experimentally revealed features of microdefects in the as-grown GaAs single crystals have been analysed using the supposition that cluster forming interstitials interact electrostatically and elastically.
引用
收藏
页码:302 / 308
页数:7
相关论文
共 17 条
[1]  
ANASTASEVA NA, 1985, VYSOKOCHISTYE VESCHE, V5, P62
[2]  
BACON DJ, 1970, PHILOS MAG, V22, P35
[3]  
BUBLIK VT, 1992, KRISTALLOGRAFIYA+, V37, P784
[4]   X-RAY DIFFUSE-SCATTERING IDENTIFICATION OF MATRIX AS-RICH MICRODEFECTS IN GAAS CRYSTALS [J].
CHARNIY, LA ;
MOROZOV, AN ;
SCHERBACHOV, KD ;
BUBLIK, VT ;
STEPANTSOVA, IV .
JOURNAL OF CRYSTAL GROWTH, 1992, 116 (3-4) :369-377
[5]   STUDY OF MICRODEFECTS AND THEIR DISTRIBUTION IN DISLOCATION-FREE SI-DOPED HB GAAS BY X-RAY DIFFUSE-SCATTERING ON TRIPLE-CRYSTAL DIFFRACTOMETER [J].
CHARNIY, LA ;
MOROZOV, AN ;
BUBLIK, VT ;
SCHERBACHEV, KD ;
STEPANTSOVA, IV ;
KAGANER, VM .
JOURNAL OF CRYSTAL GROWTH, 1992, 118 (1-2) :163-175
[6]   SI-DEFECT CONCENTRATIONS IN HEAVILY SI-DOPED GAAS - ANNEALING-INDUCED CHANGES-II [J].
CHEN, RT ;
SPITZER, WG .
JOURNAL OF ELECTRONIC MATERIALS, 1981, 10 (06) :1085-1129
[7]   THE EFFECT OF SILICON DOPING ON THE LATTICE-PARAMETER OF GALLIUM-ARSENIDE GROWN BY LIQUID-PHASE EPITAXY, VAPOR-PHASE EPITAXY AND GRADIENT-FREEZE TECHNIQUES [J].
FEWSTER, PF ;
WILLOUGHBY, AFW .
JOURNAL OF CRYSTAL GROWTH, 1980, 50 (03) :648-653
[8]   A DEFECT MODEL FOR UNDOPED AND TELLURIUM DOPED GALLIUM-ARSENIDE [J].
FEWSTER, PF .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1981, 42 (10) :883-889
[9]   THE INFLUENCE OF DISLOCATION DENSITY ON THE UNIFORMITY OF ELECTRICAL-PROPERTIES OF SI IMPLANTED, SEMI-INSULATING LEC-GAAS [J].
HONDA, T ;
ISHII, Y ;
MIYAZAWA, S ;
YAMAZAKI, H ;
NANISHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1983, 22 (05) :L270-L272
[10]   INTERSTITIAL CONDENSATION IN N+ GAAS [J].
HUTCHINSON, PW ;
DOBSON, PS .
JOURNAL OF MATERIALS SCIENCE, 1975, 10 (09) :1636-1641