COMBINED SCANNING (EBIC) AND TRANSMISSION ELECTRON-MICROSCOPIC INVESTIGATIONS OF DISLOCATIONS IN SEMICONDUCTORS

被引:50
作者
BLUMTRITT, H
GLEICHMANN, R
HEYDENREICH, J
JOHANSEN, H
机构
[1] Institut Für Festkörperphysik Und Elektronenmikroskopie, Akademie Der Wissenschaften Der Ddr
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 55卷 / 02期
关键词
D O I
10.1002/pssa.2210550231
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Statements on the electrical activity of dislocations with respect to the recombination of charge carriers are given, obtained by a combined application of scanning electron microscopy (EBIC technique) and transmission electron microscopy. The results indicate that the strength of recombination at dislocations of different type mainly depends on the degree of their decoration with impurity atoms. Model calculations carried out for special imaging conditions give the possibility to determine the minority carrier diffusion length from the half‐width of SEM/EBIC dislocation profiles and allow statements on the recombination‐active regions around defects. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA
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页码:611 / 620
页数:10
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