EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS

被引:33
作者
BEENSHMARCHWICKA, G
KROLSTEPNIEWSKA, L
SLABY, M
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关键词
D O I
10.1016/0040-6090(82)90347-9
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:33 / 39
页数:7
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共 18 条
[11]  
Maissel L.I., 1970, HDB THIN FILM TECHNO
[12]  
OKEEFFE MO, 1961, J CHEM PHYS, P1324
[13]   PROPERTIES OF TINX FILMS REACTIVELY SPUTTERED IN AN ARGON-NITROGEN ATMOSPHERE [J].
POSADOWSKI, W ;
KROLSTEPNIEWSKA, L ;
ZIOLOWSKI, Z .
THIN SOLID FILMS, 1979, 62 (03) :347-351
[14]   GRAIN-BOUNDARY CONDUCTIVITY OF CU2O POLYCRYSTALS AND RECTIFIERS [J].
WEICHMAN, FL ;
KUZEL, R .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (08) :3491-&
[15]   INFLUENCE OF ANNEALING ON ELECTRICAL CONDUCTIVITY OF SINGLE CRYSTALS OF CU2O [J].
WEICHMAN, FL ;
KUZEL, R .
CANADIAN JOURNAL OF PHYSICS, 1970, 48 (01) :63-+
[16]   ELECTRICAL CONDUCTIVITY AND THERMOELECTRIC POWER OF CU2O [J].
YOUNG, AP ;
SCHWARTZ, CM .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (02) :249-&
[17]   STUDY OF VARIATION OF VELECTRIC CONDUCTIVITY OF CU2O MONOCRYSTALS [J].
ZIELINGER, JP ;
TAPIERO, M ;
ROUBAUD, C ;
ZOUAGHI, M .
SOLID STATE COMMUNICATIONS, 1970, 8 (16) :1299-+
[18]   HALL MOBILITY AND HOLE DENSITY IN PHOTOACTIVATED CU2O SINGLE CRYSTALS [J].
ZOUAGHI, M ;
TAPIERO, M ;
ZIELINGER, JP ;
BURGRAF, R .
SOLID STATE COMMUNICATIONS, 1970, 8 (22) :1823-+