EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS

[1] ABELES B, 1975, ADV PHYS, V24, P407, DOI 10.1080/00018737500101431

[2] ABELES B, 1976, APPL SOLID STATE SCI, V6

[3] BEENSHMARCHWICK.G, 1980, 9TH P INT S REACT SO, P251

[4] INFLUENCE OF AN ELECTRIC FIELD ON QUADRUPOLE LINE OF CU2O [J]. SOLID STATE COMMUNICATIONS, 1970, 8 (07) : 521 - &

[5] THERMALLY STIMULATED CURRENTS IN CU2O [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1970, 31 (09) : 2139 - &

[6] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[7] Jarzebski ZM, 1973, OXIDE SEMICONDUCTORS

[8] KUZEL R, 1970, J APPL PHYS, V41, P271, DOI 10.1063/1.1658333

[9] KUZEL R, 1970, CAN J PHYS, V48, P2643

[10] KUZEL R, 1970, CAN J PHYS, V48, P2657

[1] ABELES B, 1975, ADV PHYS, V24, P407, DOI 10.1080/00018737500101431

[2] ABELES B, 1976, APPL SOLID STATE SCI, V6

[3] BEENSHMARCHWICK.G, 1980, 9TH P INT S REACT SO, P251

[4] INFLUENCE OF AN ELECTRIC FIELD ON QUADRUPOLE LINE OF CU2O [J]. SOLID STATE COMMUNICATIONS, 1970, 8 (07) : 521 - &

[5] THERMALLY STIMULATED CURRENTS IN CU2O [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1970, 31 (09) : 2139 - &

[6] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[7] Jarzebski ZM, 1973, OXIDE SEMICONDUCTORS

[8] KUZEL R, 1970, J APPL PHYS, V41, P271, DOI 10.1063/1.1658333

[9] KUZEL R, 1970, CAN J PHYS, V48, P2643

[10] KUZEL R, 1970, CAN J PHYS, V48, P2657