EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS

被引：33

作者：

BEENSHMARCHWICKA, G

KROLSTEPNIEWSKA, L

SLABY, M

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(82)90347-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：33 / 39

页数：7

共 18 条

[1]

ABELES B, 1975, ADV PHYS, V24, P407, DOI 10.1080/00018737500101431

[2]

ABELES B, 1976, APPL SOLID STATE SCI, V6

[3]

BEENSHMARCHWICK.G, 1980, 9TH P INT S REACT SO, P251

[4] INFLUENCE OF AN ELECTRIC FIELD ON QUADRUPOLE LINE OF CU2O [J].

DEISS, JL ;

DAUNOIS, A ;

NIKITINE, S .

[5] THERMALLY STIMULATED CURRENTS IN CU2O [J].

FILLARD, JP ;

GASIOT, J .

[6]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[7]

Jarzebski ZM, 1973, OXIDE SEMICONDUCTORS

[8]

KUZEL R, 1970, J APPL PHYS, V41, P271, DOI 10.1063/1.1658333

[9]

KUZEL R, 1970, CAN J PHYS, V48, P2643

[10]

KUZEL R, 1970, CAN J PHYS, V48, P2657