EFFECT OF AMBIENT ON THE SURFACE-RESISTANCE OF DIAMOND FILMS DURING COOLING AFTER DEPOSITION

被引：40
|
作者：
MORI, Y
EIMORI, N
HATTA, A
ITO, T
HIRAKI, A
机构：
[1] Department of Electrical Engineering, Osaka University, Suita, Osaka, 565
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 12A期
关键词：
DIAMOND FILM; COOLING AMBIENT; RESISTANCE; OXYGEN; ELECTRON ENERGY LOSS SPECTROSCOPY;
D O I：
10.1143/JJAP.31.L1718
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A remarkable ambient effect on the resistance of CVD diamond during cooling after deposition has been observed. The diamond films that were cooled slowly down to room temperature (RT) in the 10(-3) Torr range after deposition showed relatively low resistances in the range of 10(6) is similar to 10(7) OMEGA. On the other hand, high resistances over 10(3) OMEGA were observed for diamond films that were cooled down to RT in an oxygen or an air ambient and at atmospheric pressure. Among these surfaces a substantial difference was observed in the electronic structure as studied by electron energy loss spectroscopy.
引用
收藏
页码：L1718 / L1720
页数：3
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