ION-IMPLANTED CO-58 SOURCE APPLIED TO THE STUDY OF POSITRON-ANNIHILATION IN NI

被引：0
|
作者：
FLUSS, MJ [1 ]
CHASON, MK [1 ]
LERNER, JL [1 ]
SMEDSKJAER, LC [1 ]
LEGNINI, DG [1 ]
机构：
[1] ARGONNE NATL LAB,ARGONNE,IL 60439
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1980年 / 25卷 / 03期
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D O I：
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
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页码：393 / 393
页数：1
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